230000027455 binding Effects 0.000 claims abstract description 80.238000000059 patterning Methods 0.000 title claims abstract description 37.Publication of US11098070B2 publication Critical patent/US11098070B2/en Application granted granted Critical Status Active legal-status Critical Current Adjusted expiration legal-status Critical Links Publication of US20190153001A1 publication Critical patent/US20190153001A1/en Assigned to INPRIA CORPORATION reassignment INPRIA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CARDINEAU, BRIAN J., EARLEY, WILLIAM, JIANG, Kai, MEYERS, STEPHEN T. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority to US201762588546P priority Critical Application filed by Inpria Corp filed Critical Inpria Corp Priority to US16/194,491 priority patent/US11098070B2/en Assigned to INPRIA CORPORATION reassignment INPRIA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Original Assignee Inpria Corp Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
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Google Patents Organotin clusters, solutions of organotin clusters, and application to high resolution patterningĭownload PDF Info Publication number US20190153001A1 US20190153001A1 US16/194,491 US201816194491A US2019153001A1 US 20190153001 A1 US20190153001 A1 US 20190153001A1 US 201816194491 A US201816194491 A US 201816194491A US 2019153001 A1 US2019153001 A1 US 2019153001A1 Authority US United States Prior art keywords coating carbon atoms alkyl radiation ligands Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents US20190153001A1 - Organotin clusters, solutions of organotin clusters, and application to high resolution patterning US20190153001A1 - Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
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